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Fabrication of single crystal silicon resonators with narrow gaps

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5 Author(s)

This paper reports a novel method for fabrication of micromechanical resonators with very narrow gaps for electrostatic actuation. Vertical 50-180 nm wide gaps are realized using sacrificial etching of oxide sandwiched between APCVD deposited epipoly and patterned single crystal silicon structure layer of SOI wafer.

Published in:

Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on  (Volume:2 )

Date of Conference:

5-9 June 2005