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Scanning probe parallel nanolithography using multi-probes cantilever array for silicon nanodevices

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3 Author(s)
H. Gandjar ; Graduate Sch. of Sci. & Eng., Ritsumeikan Univ., Kyoto, Japan ; Y. Takagi ; Y. Isono

This research developed two types of multi-probe cantilever arrays for the parallel scanning probe microscope (SPM) based nanolithography (SPNL) with high rates of throughput. The multi-probe cantilever arrays have been fabricated by an anisotropic wet etching process. All probes have a sharp tip of a quasi-trihedral pyramidal shape composed of two (311) and [411] planes. Consequently, we have succeeded in fabrication of parallel nanometric wires and grooves on single crystal silicon (SCS) wafer using negative and positive type of SPNL techniques, respectively. Furthermore, a free suspended silicon nanowire used as a high frequency resonator was developed by the positive SPNL.

Published in:

The 13th International Conference on Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05.  (Volume:1 )

Date of Conference:

5-9 June 2005