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A High Repetition Rate Nanosecond Pulsed Power Supply for Nonthermal Plasma Generation

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4 Author(s)
Liu, Kefu ; Coll. of Electr. & Electron. Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China ; Qiong Hu ; Jian Qiu ; Houxiu Xiao

The basic principles of high repetition rate nanosecond pulsed power supplies, the design, and the implementation are presented. Voltage pulses of 20–30 kV with a rise time of 30 ns, a pulse duration of 200 ns, a pulse repetition rate of 1–2 kHz, an energy per pulse of 0.5–1 J, and the average power up to 0.5–1 kW have been achieved with total energy conversion efficiency of 90%. The protective circuit against overvoltage and the measurement of high-voltage output are described.

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Plasma Science, IEEE Transactions on  (Volume:33 ,  Issue: 4 )