By Topic

A selective CVD tungsten process for micromotors

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Liang-Yuh Chen ; Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA ; MacDonald, N.C.

A selective chemical deposition (CVD) tungsten process is used to fabricate micromotors on a silicon substrate. The fabrication of the variable capacitance micromotors that have been produced using integrated-circuit processing is described. Both rotors and stators greater than 3 micrometers thick for these motors are formed using a high deposition rate, planar, and selective CVD tungsten process. Tungsten micromotors with rotor diameters of 100 micrometers and 60 micrometers have been fabricated with amorphous silicon rotor bearings.<>

Published in:

Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on

Date of Conference:

24-27 June 1991