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A selective CVD tungsten process for micromotors

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2 Author(s)
Liang-Yuh Chen ; Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA ; N. C. MacDonald

A selective chemical deposition (CVD) tungsten process is used to fabricate micromotors on a silicon substrate. The fabrication of the variable capacitance micromotors that have been produced using integrated-circuit processing is described. Both rotors and stators greater than 3 micrometers thick for these motors are formed using a high deposition rate, planar, and selective CVD tungsten process. Tungsten micromotors with rotor diameters of 100 micrometers and 60 micrometers have been fabricated with amorphous silicon rotor bearings.<>

Published in:

Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on

Date of Conference:

24-27 June 1991