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Optimum crystallographic orientation of submicrometer CMOS devices operated at low temperatures

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10 Author(s)
Aoki, M. ; Hitachi Ltd., Kokubunji, Tokyo, Japan ; Yano, K. ; Masuhara, T. ; Ikeda, S.
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The dependence of submicrometer-channel CMOS performance on surface orientation is measured for LDD devices at both 300 and 77 K. Special emphasis is placed on determining the optimum crystalline plane for CMOS operating at low temperatures (CRYO-CMOS). A comparison of transistor parameters is experimentally made between

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Electron Devices, IEEE Transactions on  (Volume:34 ,  Issue: 1 )