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A more easily fabricated, single-substrate, ac plasma display is described which uses capacitive coupling between metallic layers to produce field intensification at discharge sites. Structures are fabricated with all thick-film technology or with thin films except for a simple thick dielectric sheet. Glow localization is much greater than that achieved with metallic-via structures due to the limited charge transfer allowed by the buried, constant capacitance at each cell. The performance of laboratory panels of 32 × 32 lines on 0.025-in centers is discussed.