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Study on micro-fabrication processes in CoFeB/MgO/CoFeB magnetic tunnel junctions

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13 Author(s)
H. Maehara ; Anelva Corp., Tokyo, Japan ; T. Osada ; M. Doi ; K. Sakamoto
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The effect of reactive ion etching (RIE) micro-fabrication process using methanol (CH3OH) gas on the magnetoresistance properties of CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) was investigated in this paper. The result has been compared with that of the MTJs etched with ion-milling method.

Published in:

INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005.

Date of Conference:

4-8 April 2005