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Automated malfunction diagnosis of a plasma etcher

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2 Author(s)
May, G.S. ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; Spanos, Costas J.

The authors present a prototype tool for real-time diagnosis of equipment malfunctions in IC fabrication processes. The approach taken focuses on integrating quantitative empirical models with qualitative knowledge-based methods. The diagnostic system uses evidential reasoning techniques to identify malfunctions by combining various sources of noisy information which originates chronologically from three primary sources: before processing (maintenance diagnosis), during processing (on-line diagnosis), and after processing (in-line diagnosis). The system has been implemented on the Lam Research Autoetch 490 automated plasma etcher located in the Berkeley Microfabrication Laboratory

Published in:

Semiconductor Manufacturing Science Symposium, 1991. ISMSS 1991., IEEE/SEMI International

Date of Conference:

20-22 May 1991