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Electron-beam systems for precision micron and submicron lithography

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1 Author(s)
A. D. Wilson ; IBM Thomas J. Watson Research Center, Yorktown Heights, NY

This paper discusses the engineering of electron-beam systems for the generation of micron and submicron lithography. Design objectives and options for the electron-beam column, X-Y workpiece stage, laser interferometer, pattern generator, software, and general engineering are the major topics.

Published in:

Proceedings of the IEEE  (Volume:71 ,  Issue: 5 )