Cart (Loading....) | Create Account
Close category search window

The permeable base transistor and its application to logic circuits

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Bozler, Carl O. ; Massachusetts Institute of Technology, Lexington, MA ; Alley, G.D.

The permeable base transistor (PBT), which has been fabricated and operated as a microwave device, is described. Numerical solutions of Poisson's equation and the continuity equation show that this transistor could be used as a very high speed switch in a logic gate. It is predicted that with this device in an inverter gate having a fan out of one, a gate delay of 2 ps and a power-delay product of 0.1 fJ are possible. The unique feature of this transistor is the use of a metal grating embedded in the single-crystal semiconductor. The voltage on this grating controls the current between the grating fingers. By proper choice of carrier concentration and grating dimensions, enhancement and depletion mode devices can be made which allow simple gate designs similar to those of nMOS to be used. The lithographic and metal grating fabrication technologies are already well advanced and appear capable of producing PBT integrated circuits. The crystal embedding techniques for placing the metal inside the crystal are new and need further development. In the design of gates and circuits the embedded metal layers will provide the advantage of an interconnect layer inside the crystal, which reduces the number of layers required on the top of the semiconductor surface.

Published in:

Proceedings of the IEEE  (Volume:70 ,  Issue: 1 )

Date of Publication:

Jan. 1982

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.