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High-power 660-nm GaInP-AlGaInP laser diodes with low vertical beam divergence angles

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5 Author(s)
Ma, Byungjin ; Opt. Semicond. Div., Central R&D Inst., Gyeonggi-Do, South Korea ; Cho, Soohaeng ; Changyoun Lee ; Kim, Youngmin
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We present 660-nm GaInP-AlGaInP ridge multiple-quantum-well laser diodes (LDs) reliably operating at high output power over 200 mW at 70°C not showing unstable higher order lateral modes owing to an adoption of a dry etching method instead of a conventional chemical wet etching for realizing steep ridge sidewalls. Employing an optimized two-step n-cladding layer LDs produced very narrow horizontal and vertical beam divergence angles of 8.6° and 15.3°, respectively. To the best of our knowledge, this vertical beam divergence angle is the lowest value ever reported in high-power 660-nm LDs operating over 200 mW and is expected to play an important role in minimizing the coupling loss between LD and passive optical components in digital versatile disc system.

Published in:

Photonics Technology Letters, IEEE  (Volume:17 ,  Issue: 7 )

Date of Publication:

July 2005

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