Referenced Items are not available for this document.
The techniques of photolithography, electron lithography, X-ray lithography, ion bombardment etching, and liftoff are reviewed, and their advantages and disadvantages assessed from the point of view of fabricating surface-acoustic-wave and thin-film optical devices.
Published in:
Proceedings of the IEEE
(Volume:62
,
Issue:
10
)
Date of Publication: Oct. 1974
- Page(s):
- 1361 - 1387
- ISSN :
- 0018-9219
- Digital Object Identifier :
- 10.1109/PROC.1974.9627
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 28 June 2005
- Issue Date :
- Oct. 1974
- Sponsored by :
- IEEE
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