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Fabrication techniques for surface-acoustic-wave and thin-film optical devices

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1 Author(s)
Smith, Henry I. ; Massachusetts Institute of Technology, Lexington, Mass.

The techniques of photolithography, electron lithography, X-ray lithography, ion bombardment etching, and liftoff are reviewed, and their advantages and disadvantages assessed from the point of view of fabricating surface-acoustic-wave and thin-film optical devices.

Published in:

Proceedings of the IEEE  (Volume:62 ,  Issue: 10 )