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Improved InAlAs/InGaAs HEMT characteristics by inserting an InAs layer into the InGaAs channel

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4 Author(s)
Akazaki, Tatsushi ; NTT LSI Lab., Kanagawa, Japan ; Arai, K. ; Enoki, T. ; Ishii, Y.

An InAlAs/InGaAs HEMT with a thin InAs layer inserted into the InGaAs channel is proposed and its electron transport properties and device performances have been investigated. By optimizing the thickness and the exact point of insertion in the InAs layer, the mobility and electron velocity at 300 K have been increased by 30% and 15%, respectively, compared to the conventional heterostructure. In addition, a maximum intrinsic transconductance of 970 mS/mm and a maximum current gain cutoff frequency of 58.1 GHz have been attained by a 0.6 mu m-gate-length device.<>

Published in:

Electron Device Letters, IEEE  (Volume:13 ,  Issue: 6 )