Scheduled System Maintenance:
On Monday, April 27th, IEEE Xplore will undergo scheduled maintenance from 1:00 PM - 3:00 PM ET (17:00 - 19:00 UTC). No interruption in service is anticipated.
By Topic

Intensity spatial filtering applied to defect detection in integrated circuit photomasks

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)

An intensity spatial filter has been devised and used for the semiautomatic photoelectric detection of 2.5-µ defects in 5-cm2photolithography masks for silicon integrated circuits. The filter is based on a simple geometric approximation to the form factor or envelope function for the intensity in the Fourier-transform plane, and permits small-area diffraction-limited illumination. This approach complements the Watkins' method.

Published in:

Proceedings of the IEEE  (Volume:60 ,  Issue: 4 )