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Recent advances and applications of plasma immersion ion implantation

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1 Author(s)
P. K. Chu ; Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, China

Many new applications of plasma immersion ion implantation (PIII) have recently emerged. In addition to the surface modification and fabrication of conventional metallurgical and semiconductor materials and structures by PIII, new areas such as biomedical materials engineering and plasma treatment of insulating materials have attracted much attention. In this paper, the progress of our recent research work of PIII on microelectronics, namely the optical characteristics of hydrogen plasma implanted silicon and fabrication of novel silicon-on-insulator materials, are described.

Published in:

Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on  (Volume:3 )

Date of Conference:

18-21 Oct. 2004