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Nanofabrication from MEMS technology

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5 Author(s)
Yuelin Wang ; Shanghai Inst. of Microsyst. & Inf. Technol., Chinese Acad. of Sci., Shanghai, China ; Xinxin Li ; Tie Li ; Heng Yang
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In this paper is reviewed a novel nanofabrication method that has been developed from the traditional MEMS technology with anisotropic etching, deep reaction ion etching and sacrificial layer processes. With such a new technology, nano needles, nano wires, nano beams, even nano devices, can be fabricated in a batch process. Beams with thickness of 12 nm, a nano tip with a heater on the beam, and a nano wire the width and thickness of which is only 50 nm, are demonstrated. The scale effect of the Young's modulus of silicon has been observed and nano-electronic-mechanical data storage has been achieved.

Published in:

Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on  (Volume:3 )

Date of Conference:

18-21 Oct. 2004