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In this paper is reviewed a novel nanofabrication method that has been developed from the traditional MEMS technology with anisotropic etching, deep reaction ion etching and sacrificial layer processes. With such a new technology, nano needles, nano wires, nano beams, even nano devices, can be fabricated in a batch process. Beams with thickness of 12 nm, a nano tip with a heater on the beam, and a nano wire the width and thickness of which is only 50 nm, are demonstrated. The scale effect of the Young's modulus of silicon has been observed and nano-electronic-mechanical data storage has been achieved.