By Topic

Recursive least squares estimation for run-to-run control with metrology delay and its application to STI etch process

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Jin Wang ; Adv. Micro Devices Inc., Austin, TX, USA ; He, Q.P. ; Qin, S.Joe ; Bode, C.A.
more authors

Run-to-run (RtR) control technology has received tremendous interest in semiconductor manufacturing. Exponentially weighted moving average (EWMA), double-EWMA, and internal model control (IMC) filters are recognized methods for online RtR estimation. In this paper, we consider recursive least squares (RLS) as an alternative for online estimation and RtR control. The relationship between EWMA-type and RLS-type estimates is analyzed and verified with simulations. Because measurement delay is almost inevitable in semiconductor manufacturing, we discuss and compare the performance of EWMA, RtR-IMC, and RLS controllers in handling measurement delay and measurement noise for processes with a deterministic drift. An ad hoc solution is proposed to handle measurement delay for processes with time-varying drifts. The results are illustrated through several simulations and a shallow trench isolation (STI) etch process as an industrial example.

Published in:

Semiconductor Manufacturing, IEEE Transactions on  (Volume:18 ,  Issue: 2 )