By Topic

Measurement of ultralow gate tunneling currents using floating-gate integrator technique

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Bin Wang ; Impinj Inc., Seattle, WA, USA ; Yanjun Ma ; R. Paulsen ; C. Diorio
more authors

We report for the first time that a gate tunneling current measurement sensitivity better than 3×10-22 A has been achieved by using a floating-gate integrator technique. The technique involves monitoring the charge change in the floating-gate integrated with an on-chip op-amp and an on-chip feedback capacitor. We used this technique to study the stress-induced leakage current (SILC) and its cycling dependence of 70 Å oxides in the direct tunneling region at oxide voltage as low as 1.9 V. The technique has been validated through correlation to direct measurement on MOSFET arrays and theoretical calculations. The measured SILC current is modeled with an Inelastic trap-assisted tunneling model.

Published in:

IEEE Electron Device Letters  (Volume:26 ,  Issue: 5 )