Cart (Loading....) | Create Account
Close category search window
 

Selective oxygen plasma etching of coatings

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Cvelbar, U. ; Plasma Lab., Jozef Stefan Inst., Ljubljana, Slovenia ; Mozetic, M. ; Klanjsek-Gunde, M.

The technology of selective oxygen plasma etching is presented. It enables the evaluation of the state of pigment dispersion, as well as the distribution of other solid particles that are added in pigmented coatings for various functional purposes. The technology is based on the selective interaction of reactive gaseous particles from oxygen plasma with the pigment-polymer composite. In our case, we wanted to etch the polymer matrix while leaving the particles untouched. Scanning electron microscope images of the effects of exposing the composite to oxygen plasma are presented.

Published in:

Plasma Science, IEEE Transactions on  (Volume:33 ,  Issue: 2 )

Date of Publication:

Apr 2005

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.