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Field emission characteristics of mixture films of nano-structure amorphous graphite and carbon nanotubes

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6 Author(s)
Lu, Zhanling ; Dept. of Phys., Zhengzhou Univ., China ; Zhang, Binglin ; Ning Yao ; Zhang, Xinyue
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The mixture film of nano-structure graphite and carbon nanotubes was fabricated on titanium coated ceramic substrate by microwave plasma chemical vapor deposition system (MPCVD). The source gas was a mixture of H2 and CH4 with flow rates of 100 sccm and 12 sccm, respectively. During the deposition, the total pressure of 6.0 KPa, substrate temperature of 850°C and microwave power of 1500W were kept for 2 hours. The surface morphology and the nano-structure of the film were examined using field emission scanning electron microscopy, X-ray diffraction, Raman scattering spectroscopy and X-ray photoelectron spectroscopy. Field emission of the film were carried out in a vacuum chamber with base pressure of below 5×10-5Pa. The initial turn-on field was 0.6V/μm and 1.7 mA/cm2 of current density at 1.7 V/μm was obtained. The stability of the emission was tested by maintaining the electric field at 1.8 V/μm. The experiments indicate that the film is an efficient and stable cathode material at low electric field.

Published in:

Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International

Date of Conference:

6-10 Sept. 2004