By Topic

A computational intelligent optical proximity correction for process distortion compensation of layout mask in subwavelength era

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Shao-Ming Yu ; Dept. of Comput. & Inf. Sci., Nat. Chiao Tung Univ., Hsinchu, Taiwan ; Yiming Li

In this work, the authors develop an intelligent OPC approach which combines the genetic algorithm (GA), the rule-based technique, and conventional model-based correction method to perform the mask correction in subwavelength era. Basic idea is that the GA and the lithography simulator is applied to find out the best size and position for a complete layout with those additional patterns which generated by rules.

Published in:

Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on

Date of Conference:

24-27 Oct. 2004