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Indium and zinc oxide (InOx, ZnO) thin films with different thickness were prepared by dc magnetron sputtering onto silicon substrates. Structural investigations carried out by atomic force microscopy (AFM) shown a strong correlation between surface topology and growth parameters. Grain radius (GR) and roughness (RMS) were found to be dependent on film thickness and deposition parameters. The results revealed a linear variation of both GR and RMS as a function of thickness, pressure, substrate temperature, and growth rate. All measurements were made at room temperature using AFM-tapping mode.