Surface texturization of monocrystaline silicon by wet chemical etching for high efficiency silicon solar cells

This paper presents the results of an experimental study regarding the increase of the silicon solar cells efficiency by texturing the front surface. Designing, patterning and surface etching processes led to refined structures with very low losses of the incident optical radiation. Photolithography has been used to generate patterns (disc hole) through the silicon dioxide layer grown at the beginning on silicon wafers. The holes (4/spl mu/m in diameter) have been uniformly distributed on the entire surface (1/spl times/l) cm and the distance between the hole centers was determined to be 20/spl mu/m. Semispherical walls have been defined in holes by isotropic etching up to join together of the wells.