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In this letter, a new methodology for program versus disturb window characterization on split gate flash cell is presented for the first time. The window can be graphically illustrated in Vwl (word-line)-Vss (source) domain under a given program current. This method can help us understand quantitatively how the window shifts versus bias conditions and find the optimal program condition. The condition obtained by this method can have the largest tolerance for program bias variations. This methodology was successfully implemented in 0.18-μm triple self-aligned (SA3) split-gate cell characterization to provide program condition for 32 M products.
Date of Publication: March 2005