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Nanostructures were formed on diced specimens of single crystal 4H-SiC silicon carbide using electron beam lithography. A scanning electron microscope was retrofitted with a commercially available electron beam lithography package and an electrostatic beam blanker to permit nanoscale lithography to be performed. A process was first developed and optimized on silicon substrates to expose, poly-methyl-methacrylate (PMMA) resist with an electron beam to make nanoscale nickel masks for reactive ion etching. The masks consist of an array of nickel dots that range in size from 20 to 100 nm in diameter. Several nanoscale structures were then fabricated in silicon carbide using electron beam lithography. The structures produced are characterized by field emission scanning electron microscopy.
Devices, Circuits and Systems, 2004. Proceedings of the Fifth IEEE International Caracas Conference on (Volume:1 )
Date of Conference: 3-5 Nov. 2004