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Interval-valued reduced order statistical interconnect modeling

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2 Author(s)
Ma, J.D. ; Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA ; Rutenbar, R.A.

We show how recent advances in the handling of correlated interval representations of range uncertainty can be used to predict the impact of statistical manufacturing variations on linear interconnect. We represent correlated statistical variations in RLC parameters as sets of correlated intervals, and show how classical model order reduction methods - AWE and PRIMA - can be re-targeted to compute interval-valued, rather than scalar-valued reductions. By applying a statistical interpretation and sampling to the resulting compact interval-valued model, we can efficiently estimate the impact of variations on the original circuit. Results show the technique can predict mean delay with errors between 5-10%, for correlated RLC parameter variations up to 35%.

Published in:

Computer Aided Design, 2004. ICCAD-2004. IEEE/ACM International Conference on

Date of Conference:

7-11 Nov. 2004

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