Referenced Items are not available for this document.
A three-dimensional topographical simulator PEACE (photo and electron beam lithography analyzing computer engineering system) is discussed. One of the difficulties in resist topographical simulation exists due to the three-dimensional resist development algorithm. An algorithm based on the cell removal model provides accurate and stable results for the three-dimensional resist development process. The program has been adapted to a supercomputer for quick computation. The simulator can successfully perform the three-dimensional development in an absolutely stable manner, and good agreement can be obtained with experiments for both photo and electron beam lithography
Published in:
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
(Volume:10
,
Issue:
6
)
Date of Publication: Jun 1991
- Page(s):
- 802 - 807
- ISSN :
- 0278-0070
- INSPEC Accession Number:
- 3958989
- Digital Object Identifier :
- 10.1109/43.137508
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 06 August 2002
- Issue Date :
- Jun 1991
- Sponsored by :
- IEEE Council on Electronic Design Automation
About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.
