Cart (Loading....) | Create Account
Close category search window
 

Using surface charge analysis to characterize the radiation response of Si/SiO2 structures

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Stacey, J.W. ; Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA ; Schrimpf, R.D. ; Fleetwood, D.M. ; Holmes, K.C.

We show that a surface charge analyzer (SCA) can be used to measure the total-dose radiation response of oxide-semiconductor structures noninvasively. A comparison of SCA measured radiation-induced oxide-trap charge and interface-trap densities with values from conventional metal oxide semiconductor (MOS) and mercury probe C--V measurements shows good agreement up to the highest total doses considered here (1000 krad(SiO2)). The measured values of oxide-trap charge and interface-trap densities monotonically increase as total dose increases. Surface charge analysis has an advantage over the C--V measurement method because it does not require a direct gate contact for measurement. The SCA also does not require extra device fabrication or special test structures for measurement, circumventing the need for post-processing that could alter the charge trapping within a thermal oxide.

Published in:

Nuclear Science, IEEE Transactions on  (Volume:51 ,  Issue: 6 )

Date of Publication:

Dec. 2004

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.