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Chalcogenide glass photonic devices

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8 Author(s)
Luther-Davies, B. ; Laser Phys. Centre, Australian Nat. Univ., Canberra, ACT, Australia ; Freeman, D. ; Ruan, Y. ; Madsen, N.
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The paper investigates both conventional "top-down" engineering approaches for chalcogenide glass-based photonic chip fabrication using contact printing and reactive ion etching as well as an alternative method for smaller structure that uses a focused ion beam (FIB) mill. This latter approach provides a versatile, one-step method of patterning chalcogenide films at the nanometer scale to create photonic crystals, waveguide tapers, gratings, micro-ring resonators, etc, whereas conventional pattern transfer and ICP reactive ion etching (RIE) allows larger structures to be fabricated.

Published in:

Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE  (Volume:2 )

Date of Conference:

7-11 Nov. 2004