Cart (Loading....) | Create Account
Close category search window
 

Binary and phase shifting mask design for optical lithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Liu, Y. ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; Zakhor, A.

The authors propose a number of pre-distorted mask design techniques for binary and phase-shifting masks. Their approach is based on modeling the imaging mechanism of a stepper by the Hopkins equations and taking advantage of the contrast-enhancement characteristics of photoresist. Optimization techniques such as the branch and bound algorithm and simulated annealing algorithm are used to systematically design pre-distorted masks under incoherent and partially coherent illumination. Computer simulations are used to show that the intensity contour shapes and developed resist shapes of their designed mask patterns are sharper than those of conventional masks. The designed phase-shifting masks are shown to result in higher contrast as well as sharper contours than binary masks. An example of phase conflicting masks designed with the algorithm is shown to outperform a simple intuitive design. This example indicates that a fairly general design procedure consisting of alternating phase shifts and their optimized phase-shift masks is a viable candidate for future phase-shifting mask design

Published in:

Semiconductor Manufacturing, IEEE Transactions on  (Volume:5 ,  Issue: 2 )

Date of Publication:

May 1992

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.