Scheduled System Maintenance:
On Monday, April 27th, IEEE Xplore will undergo scheduled maintenance from 1:00 PM - 3:00 PM ET (17:00 - 19:00 UTC). No interruption in service is anticipated.
By Topic

A large emitting area UV light source with semiconductor cathode

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Salamov, B.G. ; Phys. Dept., Gazi Univ., Ankara, Turkey ; Ciftci, Y.O. ; Colakoglu, K.

Light emission in the ultraviolet (UV) and visible (blue) range (330-440 nm) generated by a planar gas discharge system and the possibility of locally increasing the discharge light emission for a given photosensitivity of a planar GaAs semiconductor cathode has been studied. The use of metallic patched concentrators with an area of S=5×10-4 cm2 and a density of 400 cm-2 leads to a fivefold increase in the gas light density. In a system with metallic patched concentrators, the local density of gas discharge light exceeds the density of uniform gas discharge light in the ionization system as many times as the working area of the semiconductor cathode exceeds the total area of the current concentrators. By using the infrared light to excite the semiconductor cathode of the system, we have shown that the uniform discharge light emission of the device with N2 in the gap can serve as a source of UV radiation with a large emitting area of GaAs cathode if gas pressure and electric field are sufficiently high. Moreover, the use of metallic patched concentrators prolongs the working time of the cathode. The filamentation was primarily due to the formation of a space charge of positive ions in the discharge gap, which changed the discharge from the Townsend to the glow type.

Published in:

Plasma Science, IEEE Transactions on  (Volume:32 ,  Issue: 5 )