A hp22 nm node low operating power (LOP) technology with sub-10 nm gate length planar bulk CMOS devices

High performance 10 nm gate length CMOSFETs for hp22 nm node LOP is demonstrated for the first time. Key process, such as elevated source/drain extension combined with flash lamp annealing, fully silicided metal gate, novel SiON, and optimization method under high V_dd condition which taking care of SRAM performance is described. Record high transconductance of 1706 mS/mm and over 400 GHz f_i is achieved for nMOSFET. Bulk planar MOSFET structure can extend down to hp22 nm node.