Cart (Loading....) | Create Account
Close category search window

A comparative study of fluorinated amorphous carbon films synthesized by pulsed vacuum arc plasma deposition and by PECVD

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Yao, Z.Q. ; Lab. of Adv. Mater. Process., Southwest Jiaotong Univ., Chengdu, China ; Yang, P. ; Huang, N. ; Sun, H.
more authors

Summary form only given. Fluorinated amorphous carbon films have received a considerable amount of attention recently due to their chemical inertness, water-proofing, low surface energy, anti-adherence of bacteria and biocompatibility. To explore the application in biomedical devices like electrosurgical tools, fluorinated amorphous carbon films with different fluorine content were fabricated on a silicon wafer by pulsed vacuum arc plasma deposition and by PECVD. Film composition and structure were characterized by X-ray photoelectron spectroscopy (XPS) and Raman scattering spectroscopy (Raman). Surface morphology and roughness were analyzed by atomic force microscopy (AFM). Hardness and scratch resistance were measured by nano-indentation and nano-scratching, respectively. Water contact angles were measured by the sessile drop method.

Published in:

Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on

Date of Conference:

1-1 July 2004

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.