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Design considerations for DC SQUIDs fabricated in deep sub-micron technology

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1 Author(s)
Ketchen, M.B. ; IBM Thomas J. Watson Res. Center, Yorktown Heights, NY

Practical SQUIDs with well-coupled input coils of usable inductance have generally been fabricated at the 2-5 μm level of lithography. Other technologies, silicon in particular, are now routinely practised at the 0.5 μm level of lithography with impressive demonstrations at the 0.1-0.25 μm level not uncommon. The implications of applying such a fabrication capability to advance DC SQUID technology are explored. In particular, the issues of scaling practical DC SQUIDs down to the 0.1-0.25 μm regime are examined, using as a prototype design the basic washer SQUID with a spiral input coil. A technical path is mapped out that leads to a practical SQUID less than 0.05 mm2 in area with a tightly coupled 2-μH input coil, user-friendly voltage-flux characteristics, minimal flux creep related hysteresis, and coupled energy sensitivity approaching the quantum limit at 4.2 K

Published in:

Magnetics, IEEE Transactions on  (Volume:27 ,  Issue: 2 )

Date of Publication:

Mar 1991

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