Referenced Items are not available for this document.
Practical SQUIDs with well-coupled input coils of usable inductance have generally been fabricated at the 2-5 μm level of lithography. Other technologies, silicon in particular, are now routinely practised at the 0.5 μm level of lithography with impressive demonstrations at the 0.1-0.25 μm level not uncommon. The implications of applying such a fabrication capability to advance DC SQUID technology are explored. In particular, the issues of scaling practical DC SQUIDs down to the 0.1-0.25 μm regime are examined, using as a prototype design the basic washer SQUID with a spiral input coil. A technical path is mapped out that leads to a practical SQUID less than 0.05 mm2 in area with a tightly coupled 2-μH input coil, user-friendly voltage-flux characteristics, minimal flux creep related hysteresis, and coupled energy sensitivity approaching the quantum limit at 4.2 K
Published in:
Magnetics, IEEE Transactions on
(Volume:27
,
Issue:
2
)
Date of Publication: Mar 1991
- Page(s):
- 2916 - 2919
- ISSN :
- 0018-9464
- INSPEC Accession Number:
- 3949232
- Digital Object Identifier :
- 10.1109/20.133820
- Date of Current Version :
- 06 August 2002
- Issue Date :
- Mar 1991
- Sponsored by :
- IEEE Magnetics Society
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