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Temperature dependence of the anisotropy in magnetic relaxation in YBa2Cu3O7-2 thin films

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3 Author(s)
S. Vitta ; NASA Lewis Res. Center, Cleveland, OH, USA ; M. A. Stan ; S. A. Alterovitz

The relaxation of diamagnetic magnetization in the c axis aligned YBa2Cu3O7-x thin films is studied as a function of orientation and temperature in the range of 5-50 K at H=0.2 T. The magnetization M(T,H) in the orientations H||c and H⊥c and at all the temperatures is found to decrease logarithmically with time t. The activation energy for the movement of flux lines U is found to be 30-110 meV in the range 5-50 K. For H||c, U increases continuously with T, whereas for H⊥c, U has two apparent maxima: at T=10 K and T>50 K. These results are discussed in terms of the thermally activated flux motion model

Published in:

IEEE Transactions on Magnetics  (Volume:27 ,  Issue: 2 )