Cart (Loading....) | Create Account
Close category search window
 

Electrical analysis of mechanical stress induced by STI in short MOSFETs using externally applied stress

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

9 Author(s)

This paper presents an electrical analysis of mechanical stress induced by shallow trench isolation (STI) on MOSFETs of advanced 0.13 μm bulk and silicon-on-insulator (SOI) technologies. By applying external calibrated stress, we present piezoresistive coefficients measurements on these technologies, and we compare small and long transistors electrical responses, evidencing the strong effect of source drain resistance Rsd. Then, using the same approach on short devices with different gate-edge-to-STI distances, we quantitatively evaluate stress profile induced by STI and its mean value under the gate of the devices. Results are discussed to explain differences between bulk and SOI technologies, as well as between nMOS and pMOS. We show that the observed higher pMOS drain current shift is related to the process, and may be explained by doping amorphization and recrystallization effects, and not by a piezoresistive coefficient difference as usually assumed.

Published in:

Electron Devices, IEEE Transactions on  (Volume:51 ,  Issue: 8 )

Date of Publication:

Aug. 2004

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.