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Lithographic processing of polymers using plasma-generated electron beams

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6 Author(s)
Li, L. ; Dept. of Electr. Eng., Colorado State Univ., Fort Collins, CO, USA ; Krishnaswamy, J. ; Yu, Zengqi ; Collins, G.J.
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Pattern definition in polymer films is achieved using electron beams generated in soft vacuum (0.05-0.50 torr) glow discharges either on a continuous or a pulsed (20-100 ns) basis. With the continuous-mode electron beam, 7-μm transmission mask features are replicated in both polymethyl methacrylate (PMMA) and polyimide resists. Using a pulsed electron-beam submicron (~0.5 μm) features are transferred from an electron-transmitting stencil mask into the PMMA. The soft-vacuum pulsed electron beam is also eminently suited for polymer stabilization. Pulsed electron-beam hardening of 0.05-3.5 μ-thick AZ-type and MacDermid resist patterns is also demonstrated with hardened resist patterns stable to temperatures between 200° and 350°C. The demonstrated replication and pattern stabilization technique may be applicable in microelectronics packaging lithography where the resist thickness is substantial, linewidths are 1-10 μm, and registration requirements are less stringent

Published in:

Plasma Science, IEEE Transactions on  (Volume:18 ,  Issue: 2 )

Date of Publication:

Apr 1990

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