Close category search window
 

Advanced structural process monitoring, using in-line FIB

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Bloess, H. ; Infineon Technol., Dresden, Germany ; Mata, C. ; Zelenko, J. ; Levin, J.
more authors

In this paper the challenges of incorporating in-line FIB as process monitor is discussed, for both process qualification phase as well as production phase. Results of advanced FIB capabilities using Applied's SEMVision G2FIB is demonstrated on some of Infineon's most challenging process steps, previously lacking in-line capability. In addition, the efforts and results of developing best known methods (BKMs) for FIB milling, deposition techniques (capping) and imaging is discussed and shown comparing results to traditional lab profile measurement techniques.

Published in:
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop

Date of Conference: 4-6 May 2004

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.