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Highly effective junction isolation structures for PICs based on standard CMOS Process

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6 Author(s)
T. K. H. Starke ; Sch. of Eng., Univ. of Wales Swansea, UK ; P. M. Holland ; S. Hussain ; W. M. Jamal
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This paper presents novel and highly effective junction isolation structures for power integrated circuits. The negative feedback-activated junction isolation is presented and it is proven to be very effective in blocking substrate current from reaching the logic circuitry (orders of magnitude more effective than standard junction isolation techniques). Additionally, in an attempt to further improve the blocking capabilities of junction isolations the use of multiple or combined structures is investigated whilst keeping the surface area used for isolation device in the same range as for the single structures. All isolation structures presented here are based on a 0.6-μm CMOS technology.

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IEEE Transactions on Electron Devices  (Volume:51 ,  Issue: 7 )