Referenced Items are not available for this document.
We propose a generalized model, based on a simple balance equation, explaining the temperature dependence of the agglomeration time of nanoclusters in Ar-SiH4 plasmas. This model allows easy incorporation of specific mechanisms and verification of their effect on particle growth. We consider extra silane consumption due to back diffusion, an important issue for the laboratory plasma experiments and modeling results interpretation.
Published in:
Plasma Science, IEEE Transactions on
(Volume:32
,
Issue:
2
)
Date of Publication: April 2004
- Page(s):
- 731 - 737
- ISSN :
- 0093-3813
- INSPEC Accession Number:
- 8027520
- Digital Object Identifier :
- 10.1109/TPS.2004.826137
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 28 June 2004
- Issue Date :
- April 2004
- Sponsored by :
- IEEE Nuclear and Plasma Sciences Society
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