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Improving electrical performance of Cu/porous ultra-low k dielectrics single damascene lines

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5 Author(s)
Yang, L.Y. ; Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore ; Zhang, D.H. ; Li, C.Y. ; Wu, S.Y.
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An additional dielectric barrier layer SiCN was deposited on the sidewalls prior to Ta(N) metal barrier deposition. It was found that the leakage decreased with three to four orders of magnitude and breakdown voltage increased 200% compared with that without SiCN layer after burn-in at 200°C for 40 h.

Published in:

Electronics Letters  (Volume:40 ,  Issue: 12 )

Date of Publication:

10 June 2004

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