By Topic

A novel fabrication process of 3-D microstructures by double exposure in standard deep X-ray lithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Matsuzuka, N. ; Graduate Sch. of Sci. & Eng., Ritsumeikan Univ., Shiga, Japan ; Hirai, Y. ; Tabata, O.

This paper reports a novel fabrication process of 3 dimensional (3-D) micro structures by double X-ray exposure in standard deep X-ray lithography (DXL). The proposed fabrication process made it possible to realize 3-D microstructures with an inclined and curved sidewall without any apparatuses and difficult process control. In order to demonstrate the feasibility of the double X-ray exposure technique, a micro-needle array fabrication was carried out. The sharp micro-needle array with the top radius of less than 100 nm was easily and successfully fabricated by the double X-ray exposure method.

Published in:

Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)

Date of Conference:

2004