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A novel fabrication process of 3-D microstructures by double exposure in standard deep X-ray lithography

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3 Author(s)
Matsuzuka, N. ; Graduate Sch. of Sci. & Eng., Ritsumeikan Univ., Shiga, Japan ; Hirai, Y. ; Tabata, O.

This paper reports a novel fabrication process of 3 dimensional (3-D) micro structures by double X-ray exposure in standard deep X-ray lithography (DXL). The proposed fabrication process made it possible to realize 3-D microstructures with an inclined and curved sidewall without any apparatuses and difficult process control. In order to demonstrate the feasibility of the double X-ray exposure technique, a micro-needle array fabrication was carried out. The sharp micro-needle array with the top radius of less than 100 nm was easily and successfully fabricated by the double X-ray exposure method.

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Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)

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