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Three-dimensional nanofabrication (3D-NANO) down to 10-NM order using electron-beam lithography

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2 Author(s)
Yamazaki, K. ; NTT Basic Res. Labs., NTT Corp., Atsugi, Japan ; Namatsu, H.

We have devised a new technology for 10-nm-order three-dimensional nanofabrication (3D-NANO) by electron-beam nanolithography (EBL) that involves repeating the e-beam exposure, rotation, and if necessary, other processes like development and etching. 3D-NANO was achieved through the combination of a rotation drive in the EBL apparatus, a focusing system, and a beam positioning method that uses the transmission signal to provide an accuracy of 10-nm order. The fabrication of a nanofilter and nanopillars on a sphere have demonstrated that our 3D-NANO technique can create 3D structures with a resolution on the order of 10 nm and a high degree of freedom. It should have many applications in biology, chemistry, medicine, nanoelectronics, and nano-machining.

Published in:

Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)

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