Skip to Main Content
In this paper, argon ion laser of 514.5 nm, is used for interference lithography. Two mutually coherent laser beams intersect at the surface of a coated substrate, creating a sinusoidal intensity profile. This is then transferred into the holographic film, creating a line and space pattern with spatial period, Λ = λ/2sinθ, where θ = 40 ° thus, Λ = 400 nm.
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on (Volume:2 )
Date of Conference: 15-19 Dec. 2003