Referenced Items are not available for this document.
In this paper, argon ion laser of 514.5 nm, is used for interference lithography. Two mutually coherent laser beams intersect at the surface of a coated substrate, creating a sinusoidal intensity profile. This is then transferred into the holographic film, creating a line and space pattern with spatial period, Λ = λ/2sinθ, where θ = 40 ° thus, Λ = 400 nm.
Published in:
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
(Volume:2
)
Date of Conference: 15-19 Dec. 2003
- Print ISBN:
- 0-7803-7766-4
- INSPEC Accession Number:
- 7979699
- Digital Object Identifier :
- 10.1109/CLEOPR.2003.1277242
- Product Type:
- Conference Publications
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