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Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications

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7 Author(s)
Chen, H.L. ; Nat. Nano Device Lab., Hsinchu, Taiwan ; Fan, Wonder ; Wang, T.J. ; Ko, F.H.
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We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.

Published in:

Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on  (Volume:2 )

Date of Conference:

15-19 Dec. 2003

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