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FABRICS II: A Statistically Based IC Fabrication Process Simulator

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3 Author(s)
Nassif, S.R. ; Department of Electrical and Computer Engineering, Carnegie-Mellon University, Pittsburgh, PA, USA ; Strojwas, A.J. ; Director, S.W.

This paper describes FABRICS II, an IC fabriction process simulator which takes into account the statistical fluctuations inherent in the manufacturing process. FABRICS II is composed of two parts, a fabrication process simulator FAB1, and a semiconductor device simulator FAB2. The simulator produces model parameters of typical semiconductor devices manufactured in various fabrication processes (NMOS, CMOS, or bipolar). Possible applications of FABRICS II include verification and optimization of process and circuit design, yield prediction and maximization prior to IC fabrication, and IC failure analysis. Two examples which illustrate the application of FABRICS II are presented.

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Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on  (Volume:3 ,  Issue: 1 )