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Fabrication of substrate-independent hybrid distributed Bragg reflectors using metallic wafer bonding

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2 Author(s)
Lin, H.C. ; Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA ; Cheng, K.Y.

A novel hybrid distributed Bragg reflector (DBR) consisting of a substrate-independent amorphous Si-Al-oxide stack and a Cr-Au-Ni-AuGe metallic bonding layer is developed for optoelectronic applications. The metal layers serve as a high-reflectance mirror as well as an adhesion material used in wafer bonding. The hybrid DBR utilizing the reflective metals can achieve a reflectivity of above 99.95% in merely six periods. In addition, the hybrid DBR can adjoin heterogeneous materials at a low temperature of 320°C using a simple metallic bonding process. The hybrid DBR has been successfully applied to the fabrication of 1.55-μm GaInAsP-InP vertical-cavity surface-emitting laser cavities on Si substrates.

Published in:

Photonics Technology Letters, IEEE  (Volume:16 ,  Issue: 3 )

Date of Publication:

March 2004

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