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Novel fabrication process and structure of a low-voltage-operation micromirror array for optical MEMS switches

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9 Author(s)
Urano, M. ; NTT Microsystem Integration Labs, Kanagawa, Japan ; Ishii, H. ; Tanabe, Y. ; Shimamura, T.
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This paper describes a novel fabrication process for control electrodes which enables a micromirror array to be fabricated on LSIs. Electrodes designed to reduce drive voltage of the micromirror can be fabricated flexibly. Novel anti-sticking technology, in which a polyimide film is deposited only on control electrodes, prevents sticking between mirrors and electrodes. We fabricated a 100-ch micromirror array. The maximum rotational angle of 1/spl deg/ at 30 V was achieved using our developed technology.

Published in:

Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International

Date of Conference:

8-10 Dec. 2003