By Topic

Shrinking of spin-on-glass films induced by synchrotron radiation and its application to the 3-D microfabrications

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
M. M. Rahman ; Dept. of Struct. Molecular Sci., Graduate Univ. for Adv. Studies, Okazaki, Japan ; R. Tero ; T. Urisu

Spin-on-glass (SOG) is an important material in semiconductor integrated circuit fabrication and widely used for flattering of the inter level dielectrics. Typical thickness of SOG films are hundreds of nanometers. It is usually cured with reducing the thickness by heating to high temperatures in the last stage of the processes. In this paper, we have found that the thickness is also reduced by the irradiation of the synchroton radiation (SR) beam with covering the surface by Co mask. We are considering that this phenomenon is applied to three dimensional microfabrications, the degree of the shrinking depends on the thickness of the mask.

Published in:

Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Date of Conference:

29-31 Oct. 2003