Shrinking of spin-on-glass films induced by synchrotron radiation and its application to the 3-D microfabrications

Spin-on-glass (SOG) is an important material in semiconductor integrated circuit fabrication and widely used for flattering of the inter level dielectrics. Typical thickness of SOG films are hundreds of nanometers. It is usually cured with reducing the thickness by heating to high temperatures in the last stage of the processes. In this paper, we have found that the thickness is also reduced by the irradiation of the synchroton radiation (SR) beam with covering the surface by Co mask. We are considering that this phenomenon is applied to three dimensional microfabrications, the degree of the shrinking depends on the thickness of the mask.